Change search
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf
Studies on phase dependent mechanical properties of dc magnetron sputtered TaN thin films: Evaluation of super hardness in orthorhombic Ta4N phase
Show others and affiliations
2008 (English)In: Journal of Physics D: Applied Physics, Vol. 41, no 4, 045409Article in journal (Refereed) Published
Abstract [en]

The mechanical hardness of the different phases of tantalum nitride (TaNx, x ≀ 1) thin films grown by the reactive planar dc magnetron sputtering technique at 300 °C have been evaluated. The different phases have been prepared by varying the nitrogen (N2) to argon (Ar) gas ratio R in the range 0.04-0.30. The phases present in each sample and their volume fractions are obtained from x-ray diffraction and Ta 4f7/2 binding energy x-ray photoelectron spectra, respectively. The grown TaN thin films are found to contain mainly cubic-TaN0.1, orthorhombic-Ta 4N, orthorhombic-Ta6N2.5, hexagonal-TaN 0.8 and cubic-TaN phases. The hardness corresponding to each phase has been derived from the experimental hardness values using ’rule of mixtures’. A super hardness of ∌61.9 GPa is observed in orthorhombic Ta4N phase. With increase in R, a decrease in the surface oxidation of TaN has been observed. The reduced surface oxidation is attributed to the formation of stoichiometric TaN thin films. The surface morphology is found to change considerably with increase in R. © 2008 IOP Publishing Ltd.

Place, publisher, year, edition, pages
2008. Vol. 41, no 4, 045409
Keyword [en]
Binding energy; DC machinery; Hardness; Magnetron sputtering; Nitrides; Phase structure; Stoichiometry; Surface reactions; Thin films; Volume fraction; X ray diffraction analysis; X ray photoelectron spectroscopy, Binding energy x ray photoelectron spectra; Orthorhombic tantalum nitride; Reactive planar dc magnetron sputtering; Superhardness; Surface oxidation, Tantalum compounds
Identifiers
URN: urn:nbn:se:hv:diva-8546DOI: 10.1088/0022-3727/41/4/045409OAI: oai:DiVA.org:hv-8546DiVA: diva2:860185
Available from: 2015-10-10 Created: 2015-10-10 Last updated: 2015-10-10Bibliographically approved

Open Access in DiVA

No full text

Other links

Publisher's full text

Search in DiVA

By author/editor
Joshi, S. V.

Search outside of DiVA

GoogleGoogle Scholar

Altmetric score

Total: 10 hits
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf