Influence of substrate temperature and bias voltage on properties of chromium nitride thin films deposited by cylindrical cathodic arc deposition
2011 (English)In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 29, no 5, 051515Article in journal (Refereed) Published
Chromium nitride (CrN) thin films have been deposited on high speed steel (HSS) substrates using rotating cylindrical cathodic arc deposition technique and the influence of substrate temperature (TSub) and bias voltage (VSub) on the physical/mechanical and corrosion resistance properties of the films comprehensively investigated. An increase in TSub was found to significantly influence the phase composition of films, which changed from a mixture of Cr CrxN CrN to predominantly CrN. This was also accompanied by an increase in droplet formation and columnar grain size. With increase in TSub over the range investigated (230 °C to 500 °C), an increase in adhesion strength by nearly 30 was observed. In contrast, change in VSub from -50 to -150 V resulted in the growth of highly dense (111) oriented CrN thin films but with relatively little change in phase constitution, adhesion strength or microdroplet formation. A change in TSub from 230 °C to 500 °C was accompanied by a nearly 50 fall in corrosion resistance, plausibly due to the concomitant decrease in pure Cr phase content and increase in macroscopic defect concentration with increase in TSub. In view of the above, CrN thin films deposited using cylindrical cathodic arc deposition technique yield better corrosion resistance and mechanical properties when grown at low TSub. © 2011 American Vacuum Society.
Place, publisher, year, edition, pages
2011. Vol. 29, no 5, 051515
Cathodic arc deposition, Chromium nitride, Columnar grain size, Concomitant decrease, Droplet formation, High speed steel substrate, Highly dense, In-phase, Macroscopic defects, Micro droplets, Phase content, Resistance properties, Substrate temperature, Adhesion, Bias voltage, Bond strength (materials), Chromium, Corrosion resistance, Mechanical properties, Nitrides, Substrates, Thin films, Vapor deposition, Deposition
IdentifiersURN: urn:nbn:se:hv:diva-8530ISBN: 07342101 (ISSN)OAI: oai:DiVA.org:hv-8530DiVA: diva2:860132