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Factors influencing properties of CrN thin films grown by cylindrical cathodic arc physical vapor deposition on HSS substrates
2012 (English)In: Materials Science and Engineering A, Vol. 545, 155-161 p.Article in journal (Refereed) Published
Abstract [en]

The present study deals with growth of well-adherent and tough CrN thin films by cylindrical cathodic arc physical vapor deposition. The influence of substrate preparation parameters and deposition variables on film properties has been systematically investigated. The adhesion strength, hardness and crack propagation resistance (CPR) of the films were evaluated for different processing conditions. High substrate hardness and low substrate surface roughness were found to be conducive for obtaining well-adherent films. Cr ion etching was found to yield superior film properties, with the duration of etching also being a key determining factor. The nitrogen partial pressure employed during film deposition was noted to significantly influence the phase combination of the CrN x films as well as the stress levels in the deposited films. In case of multilayer CrN x films, alternating high toughness-low toughness layers were found to yield encouraging properties, with CPR values markedly higher than those obtained in mono-layer CrN x films, with no compromise in either hardness or adhesion strength. © 2012 Elsevier B.V.

Place, publisher, year, edition, pages
2012. Vol. 545, 155-161 p.
Keyword [en]
Cathodic arc deposition, CrN, Hard coatings, Mechanical properties, Multi layer thin films, Cathodic arc physical vapor deposition, Crack propagation resistance, Deposited films, Deposition variables, Film deposition, Film properties, Ion etching, Multi-layer thin film, Nitrogen partial pressures, Phase combinations, Processing condition, Stress levels, Substrate hardness, Substrate preparation, Substrate surface, Bond strength (materials), Deposition, Etching, Film preparation, Hardness, Multilayer films, Substrates, Surface roughness, Thin films, Vapors, Vapor deposition
Identifiers
URN: urn:nbn:se:hv:diva-8532ISBN: 09215093 (ISSN) OAI: oai:DiVA.org:hv-8532DiVA: diva2:859904
Available from: 2015-10-09 Created: 2015-10-08 Last updated: 2015-10-09Bibliographically approved

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