Change search
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf
Technostress and Multiple Organizational Social Media: Investigating Negative and Positive Stressors and Strains from a Person-Technology-Fit Perspective
University West, School of Business, Economics and IT, Division of Real Estate, Economics and Society. (LINA)ORCID iD: 0000-0002-1435-1632
2021 (English)In: Proceedings of the 54th Hawaii International Conference on System Sciences, 2021, p. 2780-2789Conference paper, Published paper (Other academic)
Abstract [en]

Multiple organizational social media (MOSM) foster new ways of communication, interaction and new encounters for organizations that can cause stress. Earlier research on social media and technostress have focused on negative stressors, hence there is a lack of studies focusing on both positive and negative stressors deriving from social media. In this study, both negative and positive stressors and strains deriving from using MOSM are studied in an international hotel chain with employees in eight European countries over a period of seven years. The results indicate that techno stressors such as work overload, work-life conflict, and changing algorithms creates negative stressors. However, positive stressors such as the ability to create new ways of providing service was also found. The study makes a theoretical contribution to technostress research in the Information Systems research field by uncovering both positive and negative stressors and strains created over time as well as suggests a development of the Person-Technology fit model.

Place, publisher, year, edition, pages
2021. p. 2780-2789
Keywords [en]
Digital and Social Media in Enterprise, multuple organizational social media, techno-distress, techno-eustress, technostress
National Category
Information Systems, Social aspects
Research subject
Work Integrated Learning
Identifiers
URN: urn:nbn:se:hv:diva-18071DOI: 10.24251/HICSS.2021.339ISBN: 978-0-9981331-4-0 (electronic)OAI: oai:DiVA.org:hv-18071DiVA, id: diva2:1629970
Conference
54th Hawaii International Conference on System Sciences
Available from: 2022-01-19 Created: 2022-01-19 Last updated: 2022-01-19

Open Access in DiVA

fulltext(918 kB)93 downloads
File information
File name FULLTEXT01.pdfFile size 918 kBChecksum SHA-512
98b84d049444ea1c770c0a5381f32b3a5df4c9c69be36065a273872b9d8eba55c6d83dab08c9b878195ffa3c0d9ccd9f98e4db2e5ad05c52d1c3abda0267b85a
Type fulltextMimetype application/pdf

Other links

Publisher's full text

Authority records

Högberg, Karin

Search in DiVA

By author/editor
Högberg, Karin
By organisation
Division of Real Estate, Economics and Society
Information Systems, Social aspects

Search outside of DiVA

GoogleGoogle Scholar
Total: 93 downloads
The number of downloads is the sum of all downloads of full texts. It may include eg previous versions that are now no longer available

doi
isbn
urn-nbn

Altmetric score

doi
isbn
urn-nbn
Total: 252 hits
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf