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Oxidation Behavior of HVAF-Sprayed NiCoCrAlY Coating in H2–H2O Environment
University West, Department of Engineering Science, Division of Subtractive and Additive Manufacturing. (PTW)ORCID iD: 0000-0002-7663-9631
Department of Environmental Inorganic Chemistry, Chalmers University of Technology, Gothenburg, Sweden.
University West, Department of Engineering Science, Division of Subtractive and Additive Manufacturing. (PTW)ORCID iD: 0000-0002-9578-4076
University West, Department of Engineering Science, Division of Subtractive and Additive Manufacturing. (PTW)ORCID iD: 0000-0001-5521-6894
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2016 (English)In: Oxidation of Metals, ISSN 0030-770X, E-ISSN 1573-4889, Vol. 86, no 3-4, 299-314 p.Article in journal (Refereed) Published
Abstract [en]

Isothermal oxidation behavior of an HVAF-sprayed NiCoCrAlY coating on AISI 304L was studied in an Ar–10 %H2–20 %H2O environment at 600 °C. Techniques such as BIB/SEM, EDS, and XRD were used to comprehensively characterize the coating and the coating/substrate interface to investigate the oxidation mechanisms. Results were also compared with those obtained from an uncoated AISI 304L substrate. The alumina-forming NiCoCrAlY coating was found to exhibit superior oxidation behavior due to the formation of a slow-growing and protective Al2O3 scale, while the chromia-forming bare 304L substrate lost its protective capability due to the formation of a duplex [Fe3O4 on (Fe,Cr)3O4 spinel oxide] corrosion product layer.

Place, publisher, year, edition, pages
Springer, 2016. Vol. 86, no 3-4, 299-314 p.
Keyword [en]
HVAF, MCrAlY coating, oxidation, water vapor, oxygen partial pressure
National Category
Manufacturing, Surface and Joining Technology
Research subject
ENGINEERING, Manufacturing and materials engineering
Identifiers
URN: urn:nbn:se:hv:diva-10194DOI: 10.1007/s11085-016-9637-9Scopus ID: 2-s2.0-84979248450OAI: oai:DiVA.org:hv-10194DiVA: diva2:1050629
Available from: 2016-11-29 Created: 2016-11-29 Last updated: 2017-01-02Bibliographically approved

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Sadeghimeresht, EsmaeilMarkocsan, NicolaieJoshi, Shrikant V.Nylén, Per
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