Endre søk
RefereraExporteraLink to record
Permanent link

Direct link
Referera
Referensformat
  • apa
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • Annet format
Fler format
Språk
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Annet språk
Fler språk
Utmatningsformat
  • html
  • text
  • asciidoc
  • rtf
Studies on phase dependent mechanical properties of dc magnetron sputtered TaN thin films: Evaluation of super hardness in orthorhombic Ta4N phase
Vise andre og tillknytning
2008 (engelsk)Inngår i: Journal of Physics D: Applied Physics, Vol. 41, nr 4, artikkel-id 045409Artikkel i tidsskrift (Fagfellevurdert) Published
Abstract [en]

The mechanical hardness of the different phases of tantalum nitride (TaNx, x ≀ 1) thin films grown by the reactive planar dc magnetron sputtering technique at 300 °C have been evaluated. The different phases have been prepared by varying the nitrogen (N2) to argon (Ar) gas ratio R in the range 0.04-0.30. The phases present in each sample and their volume fractions are obtained from x-ray diffraction and Ta 4f7/2 binding energy x-ray photoelectron spectra, respectively. The grown TaN thin films are found to contain mainly cubic-TaN0.1, orthorhombic-Ta 4N, orthorhombic-Ta6N2.5, hexagonal-TaN 0.8 and cubic-TaN phases. The hardness corresponding to each phase has been derived from the experimental hardness values using ’rule of mixtures’. A super hardness of ∌61.9 GPa is observed in orthorhombic Ta4N phase. With increase in R, a decrease in the surface oxidation of TaN has been observed. The reduced surface oxidation is attributed to the formation of stoichiometric TaN thin films. The surface morphology is found to change considerably with increase in R. © 2008 IOP Publishing Ltd.

sted, utgiver, år, opplag, sider
2008. Vol. 41, nr 4, artikkel-id 045409
Emneord [en]
Binding energy; DC machinery; Hardness; Magnetron sputtering; Nitrides; Phase structure; Stoichiometry; Surface reactions; Thin films; Volume fraction; X ray diffraction analysis; X ray photoelectron spectroscopy, Binding energy x ray photoelectron spectra; Orthorhombic tantalum nitride; Reactive planar dc magnetron sputtering; Superhardness; Surface oxidation, Tantalum compounds
Identifikatorer
URN: urn:nbn:se:hv:diva-8546DOI: 10.1088/0022-3727/41/4/045409OAI: oai:DiVA.org:hv-8546DiVA, id: diva2:860185
Tilgjengelig fra: 2015-10-10 Laget: 2015-10-10 Sist oppdatert: 2015-10-10bibliografisk kontrollert

Open Access i DiVA

Fulltekst mangler i DiVA

Andre lenker

Forlagets fulltekst

Personposter BETA

Joshi, S. V.

Søk i DiVA

Av forfatter/redaktør
Joshi, S. V.

Søk utenfor DiVA

GoogleGoogle Scholar

doi
urn-nbn

Altmetric

doi
urn-nbn
Totalt: 28 treff
RefereraExporteraLink to record
Permanent link

Direct link
Referera
Referensformat
  • apa
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • Annet format
Fler format
Språk
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Annet språk
Fler språk
Utmatningsformat
  • html
  • text
  • asciidoc
  • rtf